Thin film deposition Laboratory

Physical Vapor Deposition : Sputtering and Thermal Deposition

Deposition of gold, silver, platinum, copper, aluminum, chromium, titanium, copper, tungsten, metal oxides
Deposition rate: 1 A ̇
Measuring the thickness and growth rate of layers
Rotatable substrate
Base pressure: 10-5 torr

Spin Coater

100 - 10,000 rpm
Sample dimension: Max; 7 cm*7 cm